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Influence of Substrate Biasing on (Al, Ti)N Thin Films Deposited by a Hybrid HiPIMS/DC Sputtering Process

✍ Scribed by Guillaumot, A.; Lapostolle, F.; Langlade, C.; Billard, A.; Oliveira, J. C.; Cavaleiro, A.; Dublanche-Tixier, C.

Book ID
118067068
Publisher
IEEE
Year
2010
Tongue
English
Weight
694 KB
Volume
38
Category
Article
ISSN
0093-3813

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## Abstract Transparent and conductive Al‐doped ZnO (AZO) films with thickness between 0.2 and 1.1 ΞΌm were deposited by sputtering at room temperature on glass and polyethylene terephthalate (PET) substrates. All films were polycrystalline with average crystallite size increasing when the film thic