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Influence of Si oxidation methods on the distribution of suboxides at Si/SiO2 interfaces and their band alignment: a synchrotron photoemission study

✍ Scribed by I Jiménez; J.L Sacedón


Book ID
117215602
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
152 KB
Volume
482-485
Category
Article
ISSN
0039-6028

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