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Influence of processing route and SiO2 on sintering ability, CTE, and dielectric constant of β-Si4Al2O2N6

✍ Scribed by Ganesh, Ibram; Thiyagarajan, N.; Jana, D.C.; Sundararajan, G.; Olhero, S.M.; Ferreira, J.M.F.

Book ID: 126936137
Publisher: Cambridge University Press
Year: 2008
Tongue: English
Weight: 366 KB
Volume: 23
Category: Article
ISSN: 0884-2914
DOI: 10.1557/jmr.2008.0302

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