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Influence of post-treatment conditions on photoreactive effect of Zn:Fe:LiNbO3 crystals

✍ Scribed by Shuang-Quan Fang; De-cai Ma; Biao Wang; Fu-Ri Ling; G. Wang

Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
79 KB
Volume
48
Category
Article
ISSN
0895-2477

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✦ Synopsis

Abstract

Three kinds of different Zn:Fe:LiNbO~3~ wafers are prepared by proper reduction or oxidation post‐treatment processes. The optical‐damage‐resistance abilities and photorefractive properties are studied using the optical compensator technique and two‐wave coupling measurement, respectively. The holographic storage properties, that is, diffraction efficiency, writing time, erasure time, photorefractive sensitivity, and dynamic range, are also measured or calculated. The analyses indicate that the sample disposed by reduction is the most proper media for holographic storage application. Β© 2006 Wiley Periodicals, Inc. Microwave Opt Technol Lett 48: 986–988, 2006; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.21542

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