Influence of Phosphorus Doping Level and Acid Pretreatment on the Voltammetric Behavior of Phosphorus Incorporated Tetrahedral Amorphous Carbon Film Electrodes

✍ Scribed by Aiping Liu; Jiaqi Zhu; Jiecai Han; Huaping Wu; Wei Gao

• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 439 KB
• Volume: 19
• Category: Article
• ISSN: 1040-0397
• DOI: 10.1002/elan.200703931