Zr-Al-O dielectric films have been deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition technique using a (ZrO ) (Al O ) ceramic target. The 2 0.5 2 3 0.5 Zr-Al-O films deposited in 20 Pa oxygen ambient at 300 8C substrate temperat
✦ LIBER ✦
Influence of oxygen content on structure and hardness of Cr–N–O thin films prepared by pulsed laser deposition
✍ Scribed by Tsuneo Suzuki; Jun Inoue; Hajime Saito; Makoto Hirai; Hisayuki Suematsu; Weihua Jiang; Kiyoshi Yatsui
- Book ID
- 108289399
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 364 KB
- Volume
- 515
- Category
- Article
- ISSN
- 0040-6090
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