Influence of Layer Thickness and Grain Size of Chemically Deposited Lead Sulfide Films on the Long-Wavelength Limit of Photoconductivity

Tin dioxide thin-film gas sensor prepare

Tin dioxide thin-film gas sensor prepared by chemical vapour deposition: Influence of grain size and thickness on the electrical properties

✍ L. Bruno; C. Pijolat; R. Lalauze 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 405 KB

Tin dioxide films are elaborated by a chemical vapour deposition (CVD) method. An accurate control of deposition parameters (temperature, total pressure, duration) so that appropriate annealing conditions (duration, temperature) can be used to modify the structural properties of the films : grain si