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Influence of interstitial copper on diffusion length and lifetime of minority carriers in p-type silicon

โœ Scribed by Istratov, A. A.; Flink, C.; Hieslmair, H.; Heiser, T.; Weber, E. R.


Book ID
120186384
Publisher
American Institute of Physics
Year
1997
Tongue
English
Weight
292 KB
Volume
71
Category
Article
ISSN
0003-6951

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