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Influence of electric-field-assisted thermal ionization on the formation of the schottky barrier between metal and amorphous silicon

โœ Scribed by P. N. Krylov


Book ID
110120326
Publisher
Springer
Year
2000
Tongue
English
Weight
56 KB
Volume
34
Category
Article
ISSN
1063-7826

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Classified abstracts 33983407 permeates helium contained in analysed probes. It is found that the coefficient of trapping He ions in the pump is 0.76 f 30% and it does not deoend on discharge voltage in the range 0.9 to 3.3 kV. The life of the indicator is lo4 &alysesat a sensitivity of 5 x 10-r" A/