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Influence of dummy active patterns on mechanical stress induced by spin-on-glass-filled shallow trench isolation in n-MOSFETs

✍ Scribed by Dongwoo Kim; Seonhaeng Lee; T.K. Oh; S.Y. Cha; S.J. Hong; Bongkoo Kang


Book ID
104052792
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
281 KB
Volume
88
Category
Article
ISSN
0167-9317

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