Influence of dielectric constant distribution in gate dielectrics on the degradation of electron mobility by remote Coulomb scattering in inversion layers

✍ Scribed by Ono, M.; Ishihara, T.; Nishiyama, A.

• Book ID: 114617411
• Publisher: IEEE
• Year: 2004
• Tongue: English
• Weight: 209 KB
• Volume: 51
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/ted.2004.826863