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Influence of deposition temperature on the structure of 3,4,9,10-perylene tetracarboxylic dianhydride thin films on H-passivated silicon probed by Raman spectroscopy

✍ Scribed by G Salvan; D.A Tenne; A Das; T.U Kampen; D.R.T Zahn


Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
297 KB
Volume
1
Category
Article
ISSN
1566-1199

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