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Influence of deposition and processing parameters on the TCR of Ni-Cr-Cu-Al alloy film resistors : W. E. Isler and L. A. Kitchman, IEEE Trans. Parts, Mater. PckgPMP-5, No. 3, September (1969), p. 139


Publisher
Elsevier Science
Year
1970
Tongue
English
Weight
100 KB
Volume
9
Category
Article
ISSN
0026-2714

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