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Influence of beam parameters and low-energy electron neutralization on wafer charging during ion implantation

✍ Scribed by A. Cacciato; A. Heessels; R. Sanders

Book ID: 114170676
Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 194 KB
Volume: 148
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(98)00726-5

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