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Influence of Atomizing Gases on the Oxide-Film Morphology and Thickness of Aluminum Powders

✍ Scribed by S. Özbilen; A. Ünal; T. Sheppard

Book ID
111534778
Publisher
Springer-Verlag
Year
2000
Tongue
English
Weight
243 KB
Volume
53
Category
Article
ISSN
0030-770X

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Aluminum oxide (Al 2 O 3 ) films were produced on n-type (001) Si, SiO 2 and polyimide (PI) substrates by atomic layer deposition method (ALD). The surface morphologies of the coatings were characterized by XRD and AFM, respectively. The adhesive properties of the deposits were investigated as a fun