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Influence of Al co-deposition on the crystal growth of Co-based Heusler-compound thin films on Si(111)

✍ Scribed by Soichiro Oki; Shinya Yamada; Tatsuhiko Murakami; Masanobu Miyao; Kohei Hamaya

Book ID: 113937365
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 535 KB
Volume: 520
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.10.080

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