Influence of absorption mechanisms on laser-induced plasma plume
β Scribed by Robert Rozman; Igor Grabec; Edvard Govekar
- Book ID
- 104002248
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 891 KB
- Volume
- 254
- Category
- Article
- ISSN
- 0169-4332
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β¦ Synopsis
In modelling laser-induced plasma plume formation, the proper description of laser absorption in the plasma plays an important role. In the present model, absorption is described by means of three different mechanisms: inverse bremsstrahlung (IB), photoionization (PI) and absorption by small condensed clusters. Numerical solutions of the model are given for KrF laser beam irradiation (wavelength l ΒΌ 248 nm) impinging on a nickel target at various fluences. The influence of particular absorption mechanisms on the absorbed laser beam energy in the plasma plume during the pulse is shown for different fluences. Using all three absorption mechanisms, the calculated plasma properties show good agreement with the experimental results of other authors.
π SIMILAR VOLUMES
Shot-to-shot variation in the characteristics of laser produced plasma plume and surface profile of N-type silicon (1 1 1) are investigated. In order to produce plasma, a Q-switched Nd: YAG laser (1064 nm, 10 mJ, 9-14 ns) is tightly focused on silicon target in air at room temperature. Target was ex