Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing

✍ Scribed by J Reece Roth

Publisher: CRC Press
Year: 2001
Tongue: English
Leaves: 658
Category: Library

No coin nor oath required. For personal study only.

✦ Synopsis

This text is written for physicists and engineers familiar with the principles of industrial plasma engineering, and who need to obtain a thorough understanding of how plasma applications may be used in industry. It contains comprehensive references to primary research, and to industrial patents.

✦ Table of Contents

Content: Contents; Preface to Volume 2; 14. Surface Interactions in Plasma Processing; 15. Atmospheric Pressure Plasma Sources; 16. Vacuum Plasma Sources; 17. Plasma Reactors for Plasma Processing; 18. Specialized Techniques and Devices for Plasma Processing; 19. Parametric Plasma Effects On Plasma Processing; 20. Diagnostics for Plasma Processing; 21. Plasma Treatment of Surfaces; 22. Surface Modification by Implantation and Diffusion; 23. Thin-Film Deposition by Evaporative Condensation and Sputtering; 24. Plasma Chemical Vapor Deposition (PCVD); 25. Plasma Etching; Appendices; Index.
Abstract: This text is written for physicists and engineers familiar with the principles of industrial plasma engineering, and who need to obtain a thorough understanding of how plasma applications may be used in industry. It contains comprehensive references to primary research, and to industrial patents

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