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Inductively coupled plasma chemical vapour deposited AlOx/SiNy layer stacks for applications in high-efficiency industrial-type silicon solar cells

✍ Scribed by Dullweber, T.; Kranz, C.; Beier, B.; Veith, B.; Schmidt, J.; Roos, B.F.P.; Hohn, O.; Dippell, T.; Brendel, R.


Book ID
119952950
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
870 KB
Volume
112
Category
Article
ISSN
0927-0248

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