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Indium fluoride thin films prepared by sublimation under vacuum

✍ Scribed by A.S. Barrière; G. Couturier; A. Elfajri; G. Gevers; H. Guégan; B. Mombelli; V. Tournay


Book ID
103428776
Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
407 KB
Volume
209
Category
Article
ISSN
0040-6090

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The properties of thin CN x layers prepared by rapid thermal annealing (RTA) are compared with CN x layers obtained from N 2 plasma treatment. Carbon films of 6000 A ˚thickness were deposited by magnetron sputtering system on p-type silicon substrates. The samples were treated in an RTA system in N