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Increased Radiation Hardness of Short-Channel Electron-Irradiated Si 1- x Ge x Source/Drain p-Type Metal Oxide Semiconductor Field-Effect Transistors at Higher Ge Content

✍ Scribed by Nakashima, Toshiyuki; Yoneoka, Masashi; Tsunoda, Isao; Takakura, Kenichiro; Gonzalez, Mireia Bargallo; Simoen, Eddy; Claeys, Cor; Yoshino, Kenji


Book ID
125536774
Publisher
Institute of Pure and Applied Physics
Year
2013
Tongue
English
Weight
238 KB
Volume
52
Category
Article
ISSN
0021-4922

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