Incorporation of Surface Topography in the XPS Analysis of Curved or Rough Samples Covered by Thin Multilayers
✍ Scribed by Chatelier, Ronald C.; St John, Heather A. W.; Gengenbach, Thomas R.; Kingshott, Peter; Griesser, Hans J.
- Publisher
- John Wiley and Sons
- Year
- 1997
- Tongue
- English
- Weight
- 288 KB
- Volume
- 25
- Category
- Article
- ISSN
- 0142-2421
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✦ Synopsis
Approaches are described for the analysis of XPS signals from samples comprising thin conformal coatings on substrates with non-ideal surface topography. In particular, attention is focused on arbitrarily shaped rough or curved substrates. Relations are derived for the relative x-ray photoelectron intensities emitted from various elements in such non-ideal samples. The surface topography of arbitrarily rough samples is analysed by atomic force microscopy to provide a frequency histogram of the local slopes, which is incorporated into a global, multi-element analysis method for interpretation of the observed XPS elemental intensities. An analogous approach is used for the analysis of curved samples. Our algorithms also enable simultaneous analysis of successively coated multilayer structures. When the elemental composition of the individual layers is known, the Ðt procedure enables determination of the thickness values of single-layer and multilayer coatings. The range of validity of the theory is discussed.