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In situ UHV contactless C–V and XPS characterization of surface passivation process for InP using a partially nitrided Si interface control layer

✍ Scribed by Hiroshi Takahashi; Hideki Hasegawa


Book ID
108416263
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
262 KB
Volume
166
Category
Article
ISSN
0169-4332

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