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In-situ transmission electron microscopy study of glissile grain boundary dislocation relaxation in a near Σ = 3 {1 1 1} grain boundary in copper

✍ Scribed by J.P. Couzinié; B. Décamps; L. Boulanger; L. Priester

Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
293 KB
Volume
400-401
Category
Article
ISSN
0921-5093

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✦ Synopsis

An in-situ annealing experiment has been performed on an intergranular dislocation configuration composed only of glissile grain boundary dislocations observed in a near Σ = 3 {1 1 1} grain boundary in copper. Relaxation phenomena are not obvious than those predicted by theoretical models. Upon annealing, glissile intergranular dislocations are shown to overcome dislocation obstacles by node movement leading to a decrease of the total grain boundary energy.

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