In situ study of strain evolution during thin film Ti/Al(Si,Cu) reaction using synchrotron radiation

✍ Scribed by C. Rivero; O. Bostrom; P. Gergaud; O. Thomas; P. Boivin; A. Mazuelas

• Book ID: 108411235
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 290 KB
• Volume: 64
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(02)00793-1