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In situ SEM indentation experiments: Instruments, methodology, and applications

โœ Scribed by Rudy Ghisleni; Karolina Rzepiejewska-Malyska; Laetitia Philippe; Patrick Schwaller; Johann Michler


Book ID
102334211
Publisher
John Wiley and Sons
Year
2009
Tongue
English
Weight
261 KB
Volume
72
Category
Article
ISSN
1059-910X

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โœฆ Synopsis


Abstract

The purpose of this article is to present the design and capabilities of two in situ scanning electron microscope (SEM) indentation instruments covering a large load range from ฮผN to N. The capabilities and advantages of in situ SEM indentation are illustrated by two applications: indentation of a thin film and a nanowire. All the experiments were performed on electrodeposited cobalt, whose outstanding magnetic properties make it a candidate material for MEMS and NEMS devices. Microsc. Res. Tech., 2009. ยฉ 2009 Wileyโ€Liss, Inc.


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