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In situ real-time temperature and thickness measurement for SiSiGe growth on MBE and RTCVD systems

✍ Scribed by H. Möller; F.G. Böbel; B. Hertel; T. Lindenberg; G. Ritter

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 309 KB
Volume: 157
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(95)00352-5

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