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In situ Raman characterization of CeO2 thin films sputtered on (111) Si in order to optimize the post growth annealing parameters

✍ Scribed by Guhel, Y.; Bernard, J.; Boudart, B.


Book ID
123369553
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
990 KB
Volume
118
Category
Article
ISSN
0167-9317

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