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In-situ monitoring of MOVPE growth with reflectance anisotropy spectroscopy in an industrial used multi wafer reactor

✍ Scribed by C. Krahmer; M. Philippens; M. Schubert; K. Streubel


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
232 KB
Volume
3
Category
Article
ISSN
1862-6351

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