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In-situ doping of and trench-refill with LPCVD-poly-silicon (I). (PH3/SiH4) ratio as a process-controlling parameter

✍ Scribed by Dr. H. Kühne; H. Harnisch; I. Flohr; Prof. Dr. W. Bertoldi


Publisher
John Wiley and Sons
Year
1989
Tongue
English
Weight
509 KB
Volume
24
Category
Article
ISSN
0232-1300

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