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In-situ Al0.24Ga0.24In0.52As surface cleaning procedure using hydrogen radicals for molecular beam epitaxy regrowth

✍ Scribed by H. Künzel; R. Bochnia; J. Böttcher; P. Harde; A. Hase; U. Griebenow


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
450 KB
Volume
150
Category
Article
ISSN
0022-0248

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