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In flight treatment of metallurgical silicon powder by RF thermal plasma: elaboration of hydrogenated silicon deposit on a substrate

✍ Scribed by M Benmansour; E Francke; D Morvan; J Amouroux; D Ballutaud

Book ID: 118549980
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 408 KB
Volume: 403-404
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(01)01564-4

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