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Impurity diffusion behavior of bipolar transistor under low-temperature furnace annealing and high-temperature RTA and its optimization for 0.5-μm Bi-CMOS process
✍ Scribed by Norishima, M.; Iwai, H.; Niitsu, Y.; Maeguchi, K.
- Book ID
- 114534405
- Publisher
- IEEE
- Year
- 1992
- Tongue
- English
- Weight
- 854 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0018-9383
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