Impurities in electrodeposited nickel
โ Scribed by Ram D. Srivastava; H. Gesser
- Publisher
- Elsevier Science
- Year
- 1964
- Tongue
- English
- Weight
- 432 KB
- Volume
- 9
- Category
- Article
- ISSN
- 0013-4686
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โฆ Synopsis
Electrodeposited nickel contains anionic impurities from the plating solution. The variation of these impurities has been studied as a function of current density, temperature, pH, and composition of the plating solution. Impurities are co-deposited with nickel hydroxide, which is formed in the cathode film. The impurity content in the deposit is found to decrease with increase in temperature and in the acidity of the plating solution.
R&urn&-Ni &ctrod6pose contient certaines impuretts anioniques de la solution. Leur variation est 6tudiQ en fonction de i, T, pH et composition de la dite solution. Elles se deposent conjointement & Ni(OH),, qui forme un film a la cathode. Le total d'impuretes du depot decroit quand s'elevent soit la temperature, soit l'acidite de la solution.
Zusammenfassunt+Elektrolytisch
abgeschiedenes Nickel enthiilt anionische Verunreinigungen aus dem Bad.
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