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Improvement of the adhesion of silicone to aluminum using plasma polymerization

✍ Scribed by Gregory Costantino; Douglas B. Zeik; Stephen J. Clarson


Publisher
Springer
Year
1994
Tongue
English
Weight
306 KB
Volume
4
Category
Article
ISSN
1053-0495

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Improving the resistance of PECVD silico
✍ S.E. Hicks; S.K. Murad; I. Sturrock; C.D.W. Wilkinson πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 292 KB

The resistance of PECVD SiN films to dry etching is increased by more than three orders of magnitude by exposure to an oxygen plasma. In this paper we describe the oxygen treatment. Both the film thickness and the refractive index are modified by the oxygen treatment suggesting a homogenous densific