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Improvement of structural and electrical properties of Cu2O films with InN epilayers

✍ Scribed by Yang Pan; Zheng Wang; Ting Peng; Kemin Wu; Hao Wu; Chang Liu

Book ID
116629988
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
807 KB
Volume
334
Category
Article
ISSN
0022-0248

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✍ Akkari, Ferid Chaffar ;Kanzari, Mounir πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons 🌐 English βš– 500 KB

## Abstract Glancing‐angle deposition (GLAD) was used in this work to grow transparent oxide Cu~2~O thin films by annealing in air at 185 °C of copper films deposited firstly by this method onto glass substrates. The annealing temperature of 185 °C corresponds to the optimal temperature that corres