✦ LIBER ✦
Improvement of gate oxide reliability for tantalum-gate MOS devices using xenon plasma sputtering technology
✍ Scribed by Ushiki, T.; Kawai, K.; Mo-Chiun Yu; Shinohara, T.; Ino, K.; Morita, M.; Ohmi, T.
- Book ID
- 114537480
- Publisher
- IEEE
- Year
- 1998
- Tongue
- English
- Weight
- 145 KB
- Volume
- 45
- Category
- Article
- ISSN
- 0018-9383
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