✦ LIBER ✦

Improved pattern-placement accuracy in e-beam lithography via sparse-sample spatial-phase locking

✍ Scribed by J.T. Hastings; F. Zhang; J.G. Goodberlet; Henry Smith

Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 793 KB
Volume: 53
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(00)00334-8

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✦ Synopsis

A sparse-sampling algorithm has been developed for two-dimensional, spatial-phase-locked electron-beam lithography (SPLEBL). This algorithm corrects for field shift, scale and rotation errors. The algorithm can be used with a scintillating polymeric global-fiducial grid distributed over the substrate. An experimental evaluation of the sparse-sampling algorithm indicates that sub-10-nm pattern-placement accuracy can be obtained with this mode of SPLEBL.