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Improved high-temperature device transport properties and off-state characteristics of AlGaN/GaN power devices with atomic layer deposition (ALD) HfAlO high- k dielectric

✍ Scribed by Lee, B; Choi, Y H; Kirkpatrick, C; Huang, A Q; Misra, V


Book ID
120486119
Publisher
Institute of Physics
Year
2013
Tongue
English
Weight
933 KB
Volume
28
Category
Article
ISSN
0268-1242

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