Improved Electrical Properties and Thermal Stability of GeON Gate Dielectrics Formed by Plasma Nitridation of Ultrathin Oxides on Ge(100)

✍ Scribed by Watanabe, Heiji; Kutsuki, Katsuhiro; Hideshima, Iori; Okamoto, Gaku; Hosoi, Takuji; Shimura, Takayoshi

• Book ID: 120429097
• Publisher: Trans Tech Publications, Ltd.
• Year: 2011
• Tongue: English
• Weight: 398 KB
• Volume: 470
• Category: Article
• ISSN: 1662-9795
• DOI: 10.4028/www.scientific.net/KEM.470.152