✦ LIBER ✦
Improved CD control and line edge roughness in E-beam lithography through combining proximity effect correction with gray scale techniques
✍ Scribed by Jens Bolten; Thorsten Wahlbrink; Namil Koo; Heinrich Kurz; Stefan Stammberger; Uli Hofmann; Nezih Ünal
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 414 KB
- Volume
- 87
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.