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Improved 1/f noise characterization of strained SiGe on insulator MOSFETs fabricated on wafers obtained by the Ge enrichment technique

✍ Scribed by M. Valenza; J. El Husseini; F. Martinez; M. Bawedin; C. Le Royer; J.F. Damlencourt


Book ID
113916107
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
786 KB
Volume
70
Category
Article
ISSN
0038-1101

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