✦ LIBER ✦
Implanted oxide layers in silicon—establishment of a critical dose for direct formation of a stoichiometric buried SiO2 layer
✍ Scribed by RA Yankov; IH Wilson; IR Chararov
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 461 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0042-207X
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