✦ LIBER ✦
IMPACT—A point-defect-based two-dimensional process simulator: Modeling the lateral oxidation-enhanced diffusion of dopants in silicon
✍ Scribed by Collard, D.; Taniguchi, K.
- Book ID
- 114595693
- Publisher
- IEEE
- Year
- 1986
- Tongue
- English
- Weight
- 960 KB
- Volume
- 33
- Category
- Article
- ISSN
- 0018-9383
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