Impact of technology scaling in SOI back-channel total dose tolerance. A 2-D numerical study using self-consistent oxide code

✍ Scribed by Leray, J.-L.; Paillet, P.; Ferlet-Cavrois, V.; Tavernier, C.; Belhaddad, K.; Penzin, O.

• Book ID: 125951807
• Publisher: IEEE
• Year: 2000
• Tongue: English
• Weight: 599 KB
• Volume: 47
• Category: Article
• ISSN: 0018-9499
• DOI: 10.1109/23.856489