✦ LIBER ✦
Impact of scaling silicon film thickness and channel width on SOI MOSFET with reoxidized MESA isolation
✍ Scribed by Fung, S.K.H.; Chan, M.; Ko, P.K.
- Book ID
- 114537270
- Publisher
- IEEE
- Year
- 1998
- Tongue
- English
- Weight
- 202 KB
- Volume
- 45
- Category
- Article
- ISSN
- 0018-9383
No coin nor oath required. For personal study only.