✦ LIBER ✦
Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node
✍ Scribed by Qiongyan Yuan; Xiangzhao Wang; Zicheng Qiu
- Book ID
- 108145546
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 270 KB
- Volume
- 120
- Category
- Article
- ISSN
- 0030-4026
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