✦ LIBER ✦
Impact of physical and electrical thickness scaling on the reliability of plasma-nitrided gate dielectrics in a 90 nm SOI manufacturing technology
✍ Scribed by R. Geilenkeuser; K. Wieczorek; T. Mantei; F. Graetsch; L. Herrmann; J.-O. Weidner
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 334 KB
- Volume
- 118
- Category
- Article
- ISSN
- 0921-5107
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