Impact of Millisecond Flash-Assisted Rapid Thermal Annealing on SiGe Heterostructure Channel pMOSFETs With a High-/Metal Gate

✍ Scribed by Se-Hoon Lee; Majhi, P.; Ferrer, D.A.; Pui-Yee Hung; Huang, J.; Oh, J.; Wei-Yip Loh; Sassman, B.; Byoung-Gi Min; Hsing-Huang Tseng; Harris, R.; Bersuker, G.; Kirsch, P.D.; Jammy, R.; Banerjee, S.K.

• Book ID: 114620600
• Publisher: IEEE
• Year: 2011
• Tongue: English
• Weight: 964 KB
• Volume: 58
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/ted.2011.2159862