An experimental set-up based on multiwavelength interferometry, is applied in order to study in-situ the dissolution process of thin resist films. The interference function was the basis for a fitting algorithm, which analyses the experimental data and evaluates the progress of the resist thickness
β¦ LIBER β¦
Impact of low-molecular mass components (oligomers) on the glass transition in thin films of poly(methyl methacrylate)
β Scribed by Matthew Dion; Andrew B. Larson; Bryan D. Vogt
- Publisher
- John Wiley and Sons
- Year
- 2010
- Tongue
- English
- Weight
- 190 KB
- Volume
- 48
- Category
- Article
- ISSN
- 0887-6266
No coin nor oath required. For personal study only.
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